摘要本文通过磁控溅射法制备了三个调制周期的Al/NiO复合膜，分别对其进行了结构表征，元素分析和热分析，并测试了这种复合膜的电爆特性。

采用扫描电子显微镜（SEM）对多层薄膜表面以及断面的形貌进行观察，结果显示薄膜表面出现了团簇现象，层间结构较为明显，膜层厚度增长较均匀；X射线衍射（XRD）分析表明在镀膜过程有Al的氧化现象， NiO膜的X衍射角（2θ）发生3°的偏移；差式扫描量热法热分析表明多层薄膜在664℃有一个明显的放热峰，远低于理论放热量。这与Al在镀膜过程中被氧化有关，也可能是镀膜过程中NiO分子中的O原子随着Ar气逸出，导致实际反应计量比与理论反应计量比相差较大。64346

对复合薄膜的电爆实验，分析伏安特性曲线和温度曲线表明，在储能电容为47μF时，薄膜的放热在42.5V通电电压下效果最好，最高温度可以达到8000k并持续45μs。估计薄膜的最佳匹配电容器充电电压在42.5V左右。

毕业论文关键词 : 磁控溅射，Al/NiO复合薄膜， 电爆性能， 半导体桥

毕业设计说明书（论文）中文摘要

 毕业设计说明书（论文）外文摘要

Title             Research on Al/NiO reactive multilayer films               

Abstract  Influence of Al/NiO reactive multilayer films (RMFs) on traditional initiator is mainly discussed in the paper. Magnetron sputtering were used to fabricate three modulation period of Al/NiO multilayer films. And the as-deposited Al/NiO RMFs energetic materials were characterized with varied analytical techniques. 

The observation of morphology on the surface and cross section of RMFs, using scanning electron microscopy (SEM), show that clusters phenomenon appear in the films. The thickness of films is uniform and multilayer structure is clear in multilayer films. The analysis of X-ray diffraction (XRD) of the Al/NiO reactive multilayer films show that part of the Al film had been oxidized during the deposition process. The analysis of X-ray diffraction (XRD) of the Al/NiO reactive multilayer films show that the Al film may make the X-diffraction angle (2θ) of Ni film occur 3.0 ° offset. Differential scanning calorimetry analysis (DSC) show that there are two reaction exothermic peaks at 664 ℃ to 812 ℃.But the second reaction exothermic peak is not obvious.

Firing characteristics of the energetic igniters prepared by Al/NiO RMFs were determined using capacitor voltage firing set. Experimental results show that the explosion temperature over 8000k could last 45μs.

Keywords : Magnetron sputtering,        Al/NiO energetic multilayer films,  electrical explosion performance ,   SCB

1  引言 1

  1.1  薄膜材料的制备技术 1

  1.2复合含能薄膜的研究状况 1

      1.2.1  复合含能薄膜的研究背景 1

      1.2.2  国内外含能薄膜的研究状况 2

   1.3 本文主要研究内容 3

2  Al/NiO复合薄膜材料的制备 4

   2.1  真空磁控溅射镀膜技术原理 4

   2.2 Al/NiO复合薄膜制备过程 5

      2.2.1实验仪器及原材料 5

      2.2.2  薄膜制备的工艺参数