摘要：在本文中，通过 JGP-450 型多靶磁控溅射仪制备了一系列不同 Si 含量的 TiSiN 复合 薄膜。采用 X 射线衍射仪、扫描电镜、纳米压痕仪、摩擦磨损仪等实验设备对 TiSiN 复 合膜的微结构，力学性能和摩擦磨损性能进行研究。实验结果表明：TiSiN 复合薄膜呈 面心立方结构，当 Si 含量低于 15.56 at.%时检测到 TiN(111)和 TiN(222)峰，当 Si 含量大 于 15.56 at.%时,TiN(111)和 TiN(222)衍射峰消失，这可能是由于 Si 含量过多，薄膜中出 现了非晶 Si3N4，薄膜变为非晶，XRD 无法检测到。当 Si 含量低于 15.56 at.%时，随着 Si 含量的增加，TiN(111)以及 TiN(222)峰向右偏移，这可能是由于 Si 进入 TiN 晶格间隙 形成了间隙固溶体；二元 TiN 的硬度为 17.34 GPa，当 Si 含量从 0 到 15.56 at.%逐渐增 加时，TiSiN 薄膜的硬度逐渐增加，在 Si 含量为 15.56 at.%时硬度达到最大值 27.93 GPa， 当 Si 含量继续增加，薄膜的硬度降低。TiSiN 复合膜的弹性模量变化趋势与硬度相同， 在 Si 含量为 15.56 at.%时弹性模量达到最大值 240.91 GPa。继续增加 Si 含量，弹性模量 减小；二元 TiN 的薄膜的摩擦系数为 0.62，Si 的加入对薄膜的摩擦系数影响不大，摩擦 系数在 0.62 到 0.73 之间波动。薄膜的磨损率随着 Si 含量的增加先降低后升高，并在 Si 含量为 10.95 at.%时磨损率达到最小值，这可能与薄膜的硬度和非晶相含量有关，此时 的硬度与最大值相差不大，且非晶相含量也相对较少，因此磨损率最小。而在 Si 含量 为 15.56 at.%时虽然薄膜硬度达到最大值,但是由于此时 Si 含量较多导致非晶相也增多， 因而使得磨损率有所升高。

关键词：磁控溅射；TiSiN 复合薄膜；微结构；力学性能；摩擦磨损性能

Abstract：In this paper, experiments were performed using the JGP-450 multi-target magnetron sputtering apparatus for preparing a range of different Si content TiSiN composite film. The microstructure, mechanical properties and tribological properties of TiSiN composite films were investigated by means of X ray diffractometer, scanning electron microscope, friction and wear apparatus and Nano Indenter. The experimental results show that the TiSiN composite film is face centered cubic structure. When the Si content is lower than 15.56 at.%, TiN(111) and TiN(222) peaks were detected. When the Si content is greater than 15.56 at.%, TiN(111) and TiN(222) diffraction peaks disappeared, this may be due to the too much Si content, amorphous Si3N4 appeared in the film, XRD could not be detected. When the Si content is lower than 15.56 at.%, with the content of Si increase, TiN(111) and TiN(222) peak to the right. This shift may be due to the Si into the TiN lattice gap formed interstitial solid solution; the hardness of TiN is 17.34 GPa.When the content of Si from 0 to 15.56 at.% increased gradually, the hardness of TiN increase gradually, When the content of Si increases from 0 to 15.56 at.%, the hardness of TiSiN film increases gradually. When the content of Si increased, the hardness of the films decreased. The elastic modulus of TiSiN composite films with the same hardness, the content of Si is 15.56 at.%. When the elastic modulus reached the maximum value of 240.91 GPa. Continue to increase. With the Si content,the elastic modulus decreases; friction coefficient of the film TiN is 0.62, the addition of Si has little influence on friction coefficient of the films, the fluctuation of the friction coefficient between 0.62 to 0.73.The wear rate of the film increased with the content of Si increased firstly and then decreased, and the content of Si is 10.95 at.%, the wear rate reached the minimum value, which may be related to the hardness of the films and the amorphous phase content, the hardness and the maximum value is small, and the amorphous phase content  is relatively small, so the wear rate is minimum. And when the content of Si was 15.56 at.% while the hardness of film reached the maximum value. However, because of the higher content of Si, the amorphous phase also increases which made the wear rate rise.