基于Si光栅结构热致变色薄膜研究
关键字:热致变色，发射率，光栅，薄膜
Title Investigation on thermal radiation properties
of thermochromic film with Si grating structure
Abstract
With the development of the small spacecraft, there is a growing demand
to reduce its weight. Traditional thermal controller parts like MEMS
shutters are difficult to meet the requirements because of their heavy
quality and big volume. Perovskite-type manganese oxides are a material
whose emittanec will change with the temperature. It can automatically
adjust the radiation characteristics according to its own temperature
level to reach the role of active intelligent temperature control. It will
be widely used in the aerospace field.
By solid instead should is this article tells the story of the first
block perovskite manganese oxide material, and then based on Si substrate,
using ICP - 500 type automatic inductively coupled plasma etching machine
are different in the surface etching grating structure, and then by
magnetron sputtering method in Si grating on the thin film system, finally
VERTEX80V type Fourier infrared spectrometer was used to measure different
emissivity of grating depth, the grating structure on the influence of the
emissivity of thin film are obtained
Key words Thermochromism, emittance, grating structure,thin film
目 录
1 引言 1
1.1 课题研究意义及背景 1
1.2 国内外研究现状.. 2
1.3 课题主要研究内容.3
2 钙钛矿型材料的制备方法 4
2.1 钙钛矿型材料主要制备方法. 4
2.2 钙钛矿锰氧化物块体靶材制备..4
3.光栅刻蚀技术.. 8
3.1 光刻工艺.. 8
3.2 光复印工艺8
3.3 刻蚀工艺.11
4.溅射镀膜.. 14
4.1 磁控溅射工作原理14
4.2 实验系统介绍 15
4.3 磁控镀膜机操作规程. 16
4.4 热致变色薄膜样品的制备. 18
5.发射率测量与分析. 19
5.1 发射率测量方法..19
5.2 实验数据分析 21
5.3 光栅深度对热致变色薄膜发射率的影响 25
结论.. 26
致 谢. 27
参考文献 28
图表目录
图 2.1 钙钛矿锰氧化物块体靶材制备流程
图 2.2 ND2-4L 行星式球磨机
图 2.3 过滤酒精
图 2.4 50 目筛
图 2.5 KSS-1700 型快速电热炉
图 3.1 真空泵
图 3.2 SC-18 型匀胶台
图 3.3 EH20B 烘烤台
图 3.4 ABM.INC 曝光台
图 3.5 ICP-500 型全自动电感耦合等离子体刻蚀机
图 3.6 光栅结构
图 4.1 磁控溅射工作原理图
图 4.2 磁控镀膜实验系统照片
图 4.3 薄膜样品制备流程图
图 5.1VERTEX80V型傅里叶红外光谱仪图
图 5.2 干涉仪原理图
图 5.3 无光栅结构热致变色器件反射率光谱
图 5.4 光栅刻蚀深度1μm 热致变色器件反射率光谱
图 5.5 光栅刻蚀深度2μm 热致变色器件反射率光谱
图 5.6 基于Si 不同光栅结构发射率随温度变化比较图
表 5.1 温度与发射率对应数据表
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